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Ultra-high precision and stability UHV stage

The Kore Ultra-high precision and stability UHV stage is suitable for high spatial resolution surface analysis.This is a fully bakeable stage, with 20mm of travel in the x,y and z directions, with full rotation and sample isolation of 5kV available. It has been designed with low drift and high stability so that it can be used in situations where a long raster scan of an analysis probe is required such as in a high spatial resolution (10nm) secondary ion microprobes.

The stage is designed so that it can be customised for a client application. The 'generic form' is shown here.

Photo of generic UHV stage Schematic of generic stage (click for larger view)

On top of this, a customer-specific 'front end' is built. An example of a 4 position, back-mounting sample stage for SIMS is shown here.

Photo of customised UHV stage Schematic of customised UHV stage (click for larger view)

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Last updated: Tuesday, August 16, 2005, 18:16

© Kore Technology Limited 2005